Deep UV immersion interferometric lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 II, Issue , 2003, Pages 667-678

  Raub, Alex K ^a   Brueck, S R J ^a  

^a UNIVERSITY OF NEW MEXICO   (United States)

Author keywords

193 nm photoresist; DI H2O; Interferometric lithography; Krytox; Liquid immersion lithography; PFPE; Sub 100 nm half pitch

Indexed keywords

INTERFEROMETRY; LENSES; OPTICAL SYSTEMS; REFRACTIVE INDEX; WATER;

INTERFEROMETRIC LITHOGRAPHY; KRYTOX; LIQUID IMMERSION LITHOGRAPHY; PERFLUOROPOLYETHER;

PHOTOLITHOGRAPHY;

EID: 0141571345     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.482337     Document Type: Conference Paper

References (7)

1. C. Tian, J. Li, P. Wang, T Sun, "Windowless, geometry-independent, phase-matched method for the measurement of the oscillator strength of Xe, Kr, and Ar", Physical Review A, Vol. 50, No, 2, p. 1133, Aug. 1994.
2. C. V. Shank, R. V. Schmidt, "Optical Technique for Producing 0.1-m Periodic Surface Structures", Applied Physics Letters, Vol. 23, No. 3, Aug. 1973, p154.
3. W. T. Tsang, S. Wang, "Simultaneous Exposure and Development Technique for Making Gratings on Positive Photoresist", Applied Physics Letters, Vol. 24 No.4, Feb. 1974, p 196.
4. J.A. Honffnagle, W. D. Hinsberg, M. Sanches, F. A. Houle, "Liquid Immersion Deep-Ultraviolet Interferometric Lithography", J. Vac. Sci. Technol. B, Vol 17 No. 6, Nov/Dec 1999, p3306-3309
5. M. Switkes, and M. Rothschild, "Immersion Lithography at 157nm", J. Vac. Sci. Technol. B, Vol 19 No. 6, p2353-2356, Nov/Dec 2001.
6. International Technology Roadmap for Semiconductors at www.public.itrs.net.
7. S. Zaidi and S. R. J. Brueck, "High Aspect-Ratio Holographic Photoresist Gratings," Appl. Optics 27, 2999 (1988)