Near-infrared double negative metamaterials

Optics Express

Volumn 13, Issue 13, 2005, Pages 4922-4930

  Zhang, Shuang ^a   Fan, Wenjun ^a   Malloy, K J ^a   Brueck, S R J ^a   Panoiu, N C ^b   Osgood, R M ^b  

^a UNIVERSITY OF NEW MEXICO   (United States)

^b Department of Applied Physics and Applied Mathematics Columbia University ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT SCATTERING; NUMERICAL METHODS; OPTIMIZATION; PHYSICAL OPTICS; SEMICONDUCTOR DEVICE MANUFACTURE; THIN FILMS;

METAMATERIALS; NEAR-INFRARED WAVELENGTH; NEGATIVE-INDEX MATERIALS; SEMICONDUTOR PROCESSING TECHNIQUE;

OPTICAL MATERIALS;

EID: 22744431951     PISSN: 10944087     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OPEX.13.004922     Document Type: Article

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