Extension of 193-nm immersion optical lithography to the 22-nm half-pitch node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 3, 2004, Pages 1315-1322

  Brueck, Steven R J ^a   Biswas, Abani M ^a  

^a UNIVERSITY OF NEW MEXICO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

OFF-AXIS ILLUMINATION (OAI); OPTICAL PROXIMITY CORRECTION (OPC); PHASE SHIFT MASKS (PSM); RESOLUTION ENHANCEMENT TECHNIQUES (RET);

BANDWIDTH; COMPUTER SIMULATION; INTERFEROMETRY; INTERPOLATION; NATURAL FREQUENCIES; OPTICAL RESOLVING POWER; PARAMETER ESTIMATION; PHASE SHIFT; PHOTORESISTORS; POLARIZATION; REFRACTIVE INDEX;

PHOTOLITHOGRAPHY;

EID: 3843049043     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.536798     Document Type: Conference Paper

References (11)

1. ITRS available at http://public.itrs.net.
2. J. A. Hoffnagle, W. D. Hinsberg, M. Sanchez, and F. A. Houle, "Liquid Immersion Deep Ultraviolet Interferometric Lithography," J. Vac. Sci. Technol. B17, 3306 (1999).
3. M. Switkes and M. Rothschild, "Immersion Lithography at 157 nm," J. Vac. Sci. Technol. B19, 2353 (2001).
4. A. K. Raub and S. R. J. Brueck, "Deep UV Immersion Interferometric Lithography," Proc. SPIE 5040, Optical Microlithography XVI, 667-678 (2003).
5. See also Special Section of the Journal of Microlithography, Microfabrication, and Microsystems, January 2004
6. John H. Burnett and Simon Kaplan, "Measurement of the refractive index and thermo-optic coefficient of water near 193 nm," Proc. SPIE 5040, Optical Microlithography XVI, 1742-1749 (2003).
7. Abani Biswas and S. R. J. Brueck, "Simulation of the 45-nm Half-Pitch Node with 193-nm Immersion Lithography-imaging interferometric lithography and dipole illumination," J. Microlith. Microfab. and Microsys. 3, 35-43 (2004).
8. Alfred K. Wang, Resolution Enhancement Techniques in Optical Lithography, SPIE Press TT47, 2001.
9. S.H. Zaidi and S. R. J. Brueck, "Nonlinear Processes to Extend Interferometric Lithography," Proc. SPIE 3676, 371-378 (1999).
10. 10.25 lithography: 70nm L/S patterning using KrF scanners," Proc. SPIE 5626, 985-994 (2003).
11. X. Chen and S. R. J. Brueck, "Imaging Interferometric Lithography - Approaching the Resolution Limits of Optics," Opt. Lett. 24, 124-126 (1999).