244-nm imaging interferometric lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 3465-3469

  Frauenglass, A ^a   Smolev, S ^a   Biswas, A ^a   Brueck, S R J ^a  

^a UNIVERSITY OF NEW MEXICO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGING INTERFEROMETRIC LITHOGRAPHY; INTERFEROMETRIC LITHOGRAPHY; OPTICAL PROXIMITY CORRECTION; PUPIL PLANE FILTERS;

FILTERS (FOR FLUIDS); IMAGING TECHNIQUES; INTERFEROMETRY; LASERS; LIGHT POLARIZATION; LIGHTING; LINEAR SYSTEMS; OPTICAL SYSTEMS; PHASE SHIFT; TRANSFER FUNCTIONS;

PHOTOLITHOGRAPHY;

EID: 13244249978     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1821505     Document Type: Conference Paper

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