Fabrication of an integrated nanofluidic chip using interferometric lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2941-2945

  O'Brien II, M J ^a   Bisong, P ^b   Ista, L K ^b   Rabinovich, E M ^a   Garcia, A L ^b   Sibbett, S S ^c   Lopez, G P ^b   Brueck, S R J ^a  

^a UNIVERSITY OF NEW MEXICO   (United States)

^b University of New Mexico   (United States)

^c INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ELECTRON BEAM LITHOGRAPHY; ELECTROPHORESIS; ETCHING; FLUID DYNAMICS; FLUORESCENCE; INTERFACES (MATERIALS); INTERFEROMETRY; PHOTOLITHOGRAPHY; SOLUTIONS; TRANSPORT PROPERTIES;

BIOMOLECULAR TRANSPORT; NANOFLUIDIC CHIPS;

NANOSTRUCTURED MATERIALS;

EID: 0942289208     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1625964     Document Type: Conference Paper

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