Interconnect limits on gigascale integration (GSI) in the 21st century

Proceedings of the IEEE

Volumn 89, Issue 3, 2001, Pages 305-322

  Davis, Jeffrey A ^a   Venkatesan, Raguraman ^b   Kaloyeros, Alain ^a   Beylansky, Michael ^a   Souri, Shukri J ^a   Banerjee, Kaustav ^c   Saraswat, Krishna C ^d   Rahman, Arifur ^a   Reif, Rafael ^a   Meindl, James D ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^b STATE UNIVERSITY OF NEW YORK   (United States)

^c Stanford University   (United States)

^d USA   (United States)

Author keywords

Crosstalk; Epitaxial growth; Interconnections; Modeling; Scattering; Technology forecasting; Thin films; Thin film transistors; Transmission lines; Wafer bonding; Wiring

Indexed keywords

EID: 2442653656     PISSN: 00189219     EISSN: None     Source Type: Journal    
DOI: 10.1109/5.915376     Document Type: Article

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