High-performance germanium-seeded laterally crystallized TFT's for vertical device integration

IEEE Transactions on Electron Devices

Volumn 45, Issue 9, 1998, Pages 1934-1939

  Subramanian, Vivek ^a   Saraswat, Krishna C ^a  

^a Stanford University   (United States)

Author keywords

Lateral crystallization; Soi technology; Solid phase crystallization; Thin film transistors; Vertical integration

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; CMOS INTEGRATED CIRCUITS; CRYSTALLIZATION; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING GERMANIUM; SILICON ON INSULATOR TECHNOLOGY; ULSI CIRCUITS; VLSI CIRCUITS;

LATERAL CRYSTALLIZATION; SOLID PHASE CRYSTALLIZATION; VERTICAL DEVICE INTEGRATION;

THIN FILM TRANSISTORS;

EID: 0032163137     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.711358     Document Type: Article

References (14)

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