Large deviation from Matthiessen's rule in chemical vapour deposited copper films and its correlation with nanostructure

Journal of Physics D: Applied Physics

Volumn 30, Issue 5, 1997, Pages

  Ramaswamy, Geetha ^a   Raychaudhuri, A K ^a   Goswami, Jaydeb ^a   Shivashankar, S A ^a  

^a INDIAN INSTITUTE OF SCIENCE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; ELECTRIC CONDUCTIVITY; FILM GROWTH; GRAIN BOUNDARIES; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; SCANNING TUNNELING MICROSCOPY; SILICON; THERMAL EFFECTS;

COPPER FILM; ELASTIC SCATTERING; MATTHIESSEN RULE; SURFACE SCATTERING;

METALLIC FILMS;

EID: 0031557370     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/30/5/001     Document Type: Article

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