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Volumn 18, Issue 3, 2005, Pages 355-364

Characterization and lithographic performance of silsesquioxane 193 nm bilayer resists

Author keywords

193 nm lithography; Bilayer resists; Chemical amplification; Deprotection; Dissolution kinetics; Fluoroalcohol; Hydrogen bonding; Quartz crystal microbalance; Silanol condensation

Indexed keywords


EID: 22144470163     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.18.355     Document Type: Article
Times cited : (6)

References (41)
  • 39
    • 0041913068 scopus 로고    scopus 로고
    • "Micro- and Nano-Patterning Polymers," H. Ito, E. Reichmanis, O. Nalamasu, and T. Ueno, Eds., American Chemical Society, Washington, D. C., Chap. 16
    • H. Ito, N. Seehof, R. Sato, T. Nakayama, and M. Ueda, in ACS Symposium Series 706, "Micro- and Nano-Patterning Polymers," H. Ito, E. Reichmanis, O. Nalamasu, and T. Ueno, Eds., American Chemical Society, Washington, D. C., Chap. 16 (1998) 208.
    • (1998) ACS Symposium Series , vol.706 , pp. 208
    • Ito, H.1    Seehof, N.2    Sato, R.3    Nakayama, T.4    Ueda, M.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.