Bilayer resist approach for 193-nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2724, Issue , 1996, Pages 344-354

  Schaedeli, Ulrich P ^a   Tinguely, Eric ^a   Blakeney, Andrew J ^a   Falcigno, Pasquale A ^a   Kunz, Roderick R ^a  

^a CIBA GEIGY LTD   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; EXCIMER LASERS; MICROELECTRONICS; MICROMETERS; PHOTOLITHOGRAPHY; POLYMERS; SEMICONDUCTING SILICON; STABILITY;

BILAYER RESISTS; NOVOLAK RESIN; SELECTIVE ETCHING;

PHOTORESISTS;

EID: 0029765947     PISSN: None     EISSN: None     Source Type: None    
DOI: 10.1117/12.241833     Document Type: Conference Paper

References (21)