Chemically amplified resist based on the methacrylate polymer with 2-trimethylsilyl-2-propyl ester protecting group

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue I, 1999, Pages 420-428

  Kim, Jin Beak ^a   Kim, Hyunwoo ^a   Lee, Si Hyung ^a   Choi, Sang Joon ^a   Moon, Joo Tae ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ESTERS; EXCIMER LASERS; POLYMERS; PROTECTIVE COATINGS; REACTIVE ION ETCHING; SEMICONDUCTING SILICON; SYNTHESIS (CHEMICAL);

CHEMICALLY AMPLIFIED RESISTS; DRY-DEVELOPABLE PHOTORESISTS;

PHOTORESISTS;

EID: 0032651668     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350224     Document Type: Conference Paper

References (13)