Development of silicon containing resists for sub-100nm lithography

Journal of Photopolymer Science and Technology

Volumn 17, Issue 4, 2004, Pages 519-525

  Hatakeyama, Jun ^a   Takeda, Takanobu ^a   Nakashima, Mutsuo ^a   Kinsho, Takeshi ^a   Kawai, Yoshio ^a   Ishihara, Toshinobu ^a  

^a SHIN ETSU CHEMICAL CO LTD   (Japan)

Author keywords

Alternating copolymer; Bilayer resist; Silicon containing olefin; SSQ

Indexed keywords

ALCOHOL DERIVATIVE; ALKENE DERIVATIVE; COPOLYMER; MALEIC ANHYDRIDE; OXYGEN; POLYSILSESQUIOXANE; SILANE DERIVATIVE; SILICON; UNCLASSIFIED DRUG;

ADHESION; ARTICLE; CHEMICAL STRUCTURE; FLUORINATION; LITHOGRAPHY; SYNTHESIS; TECHNOLOGY;

EID: 3142543245     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.17.519     Document Type: Article

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