Fluoropolymer resists: Fundamentals and lithographic evaluation

Journal of Photopolymer Science and Technology

Volumn 17, Issue 4, 2004, Pages 609-619

  Ito, H ^a   Truong, H D ^a   Rhodes, L F ^b   Chang, C ^b   Langsdorf, L J ^b   Sidaway, H A ^b   Maeda, K ^c   Sumida, S ^c  

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b Promerus LLC   (United States)

^c CENTRAL GLASS CO LTD   (Japan)

Author keywords

157 nm lithography; 2 trifluoromethylacrylate; Chemical amplification; Dissolution inhibition; Dissolution kinetics; Hexafluoroisopropanol; Hydrogen bonding; Quartz crystal microbalance; Radical copolymerization

Indexed keywords

ACID; ESTER; ETHER DERIVATIVE; FLUORINE DERIVATIVE; HEXAFLUORO 2 PROPANOL; MONOMER; NORBORNANE DERIVATIVE; NORBORNANE HEXAFLUOROALCOHOL; NORBORNENE DERIVATIVE; POLY(NORBORNENE HEXAFLUOROALCOHOL); POLYHYDROXYSTYRENE; POLYMER; STYRENE DERIVATIVE; TETRAMETHYLAMMONIUM; UNCLASSIFIED DRUG; VINYL DERIVATIVE;

ABSORPTION; ADDITION REACTION; AQUEOUS SOLUTION; ARTICLE; CHEMICAL ANALYSIS; CHEMICAL INTERACTION; CHEMICAL REACTION; CONCENTRATION RESPONSE; DISSOLUTION; EVALUATION; HYDROGEN BOND; HYDROPHILICITY; IMAGING SYSTEM; ISOMER; KINETICS; LITHOGRAPHY; MOLECULAR WEIGHT; PARAMETER; POLYMERIZATION; REACTION ANALYSIS; SURFACE PROPERTY; SYNTHESIS; TECHNIQUE;

EID: 3142653676     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.17.609     Document Type: Article

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