Combinatorial resist processing studies

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 2, 2004, Pages 1165-1173

  Larson, Carl E ^a   Wallraff, Gregory M ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

Chemically amplified resist; Combinatorial chemistry; Processing conditions; Thermal gradient

Indexed keywords

CHEMICALLY AMPLIFIED RESISTS; COMBINATORIAL CHEMISTRY; CRITICAL DIMENSION (CD); THERMAL GRADIENT;

MASKS; MATERIALS SCIENCE; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS; THERMAL EFFECTS;

PHOTORESISTS;

EID: 3843097041     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.538684     Document Type: Conference Paper

References (6)

1. G.E.P. Box and N.R. Draper, Empirical Model-building and Response Surfaces, John Wiley & Sons, New York (1987)
2. G. Taguchi, System of Experimental Design, Vols. 1 and 2, American Supplier Institute Press, Dearborn, Michigan (1987)
3. Meredith, J.C.; Karim, A.; Amis, E.J. "High-Throughput Measurement of Polymer Blend Phase Behavior" Macromolecules 33, 5760 (2000)
4. Meridith, J.C.; Smith, A.P.; Karim, A; Amis, E.J. "Combinatorial Materials Science for Polymer Thin-Film Dewetting" Macromolecules 33, 9747 (2000)
5. Lenhart, J.L.; Jones, R.L.; Lin, E.K.; Soles, C.L.; Wu, W.; Goldfarb, D.L.; Angelopoulos, M. "Combinatorial Methodologies offer potential for rapid research of photoresist materials and formulations" J. Vac Sci. Technol. B 20(2), 704 (2002)
6. Fender, N.; Brock, P.J; Chau, W.; Bangsaruntip, S.; Marhorowala, A.; Wallraff, G.M.; Hinsberg, W.; Larson, C.E.; Ito, H.; Breyta, G.; Burnham, K.; Truong, H.; Lawson, P.; Allen, R.D., Proc. SPIE-Int. Soc.Opt. Eng 4345, 417 (2001)