High resolution 248 nm bilayer resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue I, 1999, Pages 241-251

  Lin, Qinghuang ^a   Petrillo, K ^a   Babich, K ^a   La Tulipe, D ^a   Medeiros, D ^a   Mahorowala, A ^a   Simons, J ^a   Angelopoulos, M ^a   Wallraff, G ^a   Larson, C ^a   Fenzel Alexander, D ^a   Sooriyakumaran, R ^a   Breyta, G ^a   Brock, P ^a   DiPietro, R ^a   Hofer, D ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; OPTICAL RESOLVING POWER; PLASMA ETCHING; REACTIVE ION ETCHING; THIN FILMS;

BILAYER RESISTS; DEPTH OF FOCUS (DOF);

PHOTORESISTS;

EID: 0032631908     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350207     Document Type: Conference Paper

References (29)