Second generation 193 nm bilayer resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue II, 1999, Pages 1034-1039

  Foster, Patrick ^a   Steinhausler, Thomas ^a   Biafore, John J ^a   Spaziano, Gregory ^a   Slater, Sydney G ^a   Blakeney, Andrew J ^a  

^a Arch Chemicals Incorporated   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COPOLYMERS; LIGHT REFLECTION; ULTRAVIOLET RADIATION;

BILAYER PHOTORESISTS;

PHOTORESISTS;

EID: 0032675482     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350153     Document Type: Conference Paper

References (6)