Outgassing of organic vapors from 193 nm photoresists: Impact on atmospheric purity near the lens optics

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3330-3334

  Kunz, R R ^a   Downs, D K ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040707402     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591006     Document Type: Article

References (6)

1. R. R. Kunz, R. D. Allen, and G. M. Wallraff, Proc. SPIE 1925, 167 (1993).
2. H. Ito, W. P. England, N. J. Clecak, G. Breyta, H. Lee, D. Y. Yoon, R. Sooriyakumaran, and W. D. Hinsberg, Proc. SPIE 1925, 65 (1993).
3. K. Nozaki and E. Yano, J. Photopolym. Sci. Technol. 11, 493 (1998).
4. F. M. Houlihan et al., Proc. SPIE 3678, 264 (1999).
5. R. R. Kunz, V. Liberman, and D. K. Downs, J. Vac. Sci. Technol. B (submitted).
6. D. Grosjean and K. Fung, J. Air. Pollut. Control. Assoc. 34, 537 (1984).