Comparison of ArF bilayer resists for sub-90nm L/S fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 I, Issue , 2003, Pages 249-256

  Hong, J ^a   Kim, Hyun Woo ^a   Lee, Sung Ho ^a   Woo, Sang Gyun ^a   Cho, Hanku ^a   Han, Woo Sung ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

ArF; Bilayer; Dry development

Indexed keywords

ARGON; DURABILITY; PHOTOLITHOGRAPHY; PLASMA ETCHING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SUBSTRATES; THICKNESS MEASUREMENT;

ARGON FLUORIDE; BILAYER SCHEME; PHOTO PATTERNING;

PHOTORESISTS;

EID: 0141611764     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485114     Document Type: Conference Paper

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