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Volumn 97, Issue 8, 2005, Pages

Optical second harmonic generation studies of ultrathin high-k dielectric stacks

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; DETRAPPING; OPTICAL ROUGHNESS; THIN METALS;

EID: 21444447325     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1861146     Document Type: Article
Times cited : (30)

References (37)
  • 1
    • 21444450256 scopus 로고    scopus 로고
    • Defects in SiO2 and Related Dielectrics: Science and Technology, edited by G.Pacchioni, L.Skuja, and D. L.Griscom (Kluwer Academic, Dordrecht
    • E. P. Gusev, Ultrathin Oxide Films for Advanced Gate Dielectrics Applications. Current Progress and Future Challenges, in Defects in SiO2 and Related Dielectrics: Science and Technology, edited by, G. Pacchioni, L. Skuja, and, D. L. Griscom, (Kluwer Academic, Dordrecht, 2000), pp. 557-579.
    • (2000) Ultrathin Oxide Films for Advanced Gate Dielectrics Applications. Current Progress and Future Challenges , pp. 557-579
    • Gusev, E.P.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.