Universal mechanism for gas adsorption and electron trapping on oxidized silicon

Physical Review Letters

Volumn 82, Issue 2, 1999, Pages 359-361

  Shamir, N ^a,c   Mihaychuk, J G ^a,d   van Driel, H M ^a   Kreuzer, H J ^b  

^a UNIVERSITY OF TORONTO   (Canada)

^b DALHOUSIE UNIVERSITY   (Canada)

^c NUCLEAR RESEARCH CENTER NEGEV   (Israel)

^d DALSA Corporation   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002979480     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.82.359     Document Type: Article

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