Electron Photoinjection from Silicon to Ultrathin SiO2 Films via Ambient Oxygen

Physical Review Letters

Volumn 77, Issue 5, 1996, Pages 920-923

  Bloch, J ^a   Mihaychuk, J G ^a   Van Driel, H M ^a  

^a UNIVERSITY OF TORONTO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001186074     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.77.920     Document Type: Article

References (31)

1. T. K. Whidden, P. Thanikasalam, M. J. Rack, and D. K. Ferry, J. Vac. Sci. Technol. B, 13, 1618 (1995).JVTBD9
2. H. Richter, T. E. Orlowski, M. Kelly, and G. Margaritondo, J. Appl. Phys., 56, 2351 (1984)
3. T. E. Orlowski and D. A. Mantell, J. Appl. Phys., 64, 4410 (1988).JAPIAU
4. P. J. Caplan, E. H. Poindexter, and S. R. Morrison, J. Appl. Phys., 53, 541 (1982).JAPIAU
5. F. Bozso and Ph. Avouris, Phys. Rev. B, 44, 9129 (1991).PRBMDO
6. R. D. Levine and R. B. Bernstein, Molecular Reaction Dynamics and Chemical Reactivity (Oxford University Press, Oxford, 1987), p. 134.
7. R. Williams, Phys. Rev., 140, A569 (1965).PHRVAO
8. E. M. Young and W. A. Tiller, Appl. Phys. Lett., 50, 46 (1987).APPLAB
9. Handbook.of Optical Constants of Solids, E. D. Palik (Academic Press, Orlando, 1985).
10. T. F. Heinz, in Nonlinear Surface Electromagnetic Phenomena, H.-E. Ponath and G. I. Stegeman, Modern Problems in Condensed Matter Sciences Vol. 29 (North-Holland, Amsterdam, 1991), p. 355.
11. Y. R. Shen, Nature (London), 337, 519 (1989).NATUAS
12. G. Lüpke, D. J. Bottomley, and H. M. van Driel, Phys. Rev. B, 47, 10389 (1993).PRBMDO
13. W. L. Daum, H.-J. Krause, U. Reichel, and H. Ibach, Phys. Rev. Lett., 71, 1234 (1993).PRLTAO
14. J. I. Dadap, B. Doris, Q. Deng, M. C. Downer, J. K. Lowell, and A. C. Diebold, Appl. Phys. Lett., 64, 2139 (1994).APPLAB
15. C. Meyer, G. Lüpke, U. Emmerichs, F. Wolter, H. Kurz, C. H. Bjorkman, and G. Lucovsky, Phys. Rev. Lett., 74, 3001 (1995).PRLTAO
16. O. A. Aktsipetrov, A. A. Fedyanin, V. N. Golovinka, and T. V. Murzina, Opt. Lett., 19, 1450 (1994).OPLEDP
17. G. Lüpke, C. Meyer, C. Ohlhoff, H. Kurz, S. Lehmann, and G. Marowsky, Opt. Lett., 20, 1997 (1995).OPLEDP
18. J. G. Mihaychuk, J. Bloch, Y. Liu, and H. M. van Driel, Opt. Lett., 20, 2063 (1995).OPLEDP
19. J. I. Dadap, X. F. Hu, M. H. Anderson, M. C. Downer, J. K. Lowell, and O. A. Aktsipetrov, Phys. Rev. B, 53, 7607 (1996).PRBMDO
20. J. A. Valdmanis and G. Mourou, IEEE J. Quantum Electron., 22, 69 (1986).IEJQA7
21. M. S. Yeganeh, J. Qi, A. G. Yodh, and M. C. Tamargo, Phys. Rev. Lett., 69, 3579 (1992)
22. J. Qi, M. S. Yeganeh, I. Koltover, A. G. Yodh, and W. M. Theis, Phys. Rev. Lett., 71, 633 (1993).PRLTAO
23. E. M. Allegretto and J. A. Bardwell (unpublished).
24. E. C. Fox and H. M. van Driel, IEEE J. Quantum Electron., 25, 1104 (1989). IEJQA7
25. B. S. Wherret, J. Opt. Soc. Am. B, 1, 67 (1984)
26. V. Nathan, A. H. Guenther, and S. S. Mitra, J. Opt. Soc. Am. B, 2, 294 (1985). JOBPDE
27. E. A. Irene and E. A. Lewis, Appl. Phys. Lett., 51, 767 (1987).APPLAB
28. T. R. Oldham, A. J. Lelis, and F. B. McLean, IEEE Trans. Nucl. Sci., NS-33, 1203 (1986).IETNAE
29. P. W. Atkins, Physical Chemistry (Oxford University Press, Oxford, 1988), p. 822.
30. C. N. Berglund and R. J. Powell, J. Appl. Phys., 42, 573 (1971).JAPIAU
31. R. H. Doremus, J. Phys. Chem., 80, 1773 (1976).JPCHAX