Materials modification using intense ion beams

Proceedings of the IEEE

Volumn 92, Issue 7, 2004, Pages 1057-1080

  Renk, Timothy J ^a   Provencio, Paula P ^a   Prasad, Somuri V ^a   Shlapakovski, Anatoli S ^b   Petrov, Anatoly V ^b   Yatsui, Kiyoshi ^c   Jiang, Weihua ^c   Suematsu, Hisayuki ^c  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b TOMSK POLYTECHNIC UNIVERSITY   (Russian Federation)

^c NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Intense pulsed ion beams; Ion irradiation; Ion sources; Materials modification; Pulsed ion beam evaporation; Radiation effects: Mechanical properties; Thin film formation

Indexed keywords

ALLOYING; EVAPORATION; ION SOURCES; KINETIC ENERGY; MECHANICAL PROPERTIES; RADIATION EFFECTS; SURFACE TREATMENT; SYNTHESIS (CHEMICAL); THIN FILMS;

INTENSE PULSED ION BEAMS; ION IRRADIATION; MATERIALS MODIFICATION; PULSED ION-BEAM EVAPORATION; THIN-FILM FORMATION;

ION BEAMS;

EID: 20844436272     PISSN: 00189219     EISSN: None     Source Type: Journal    
DOI: 10.1109/JPROC.2004.829024     Document Type: Conference Paper

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