Pulsed ion-beam evaporation for thin-film deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 2 B, 2001, Pages 1026-1029

  Jiang, W ^a   Ide, K ^a   Kitayama, S ^a   Suzuki, T ^a   Yatsui, K ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Ablation plasma; Ion beam; Pulsed power; Thin film

Indexed keywords

ABLATION; DEPOSITION; ION BEAMS; MELTING; PLASMA DIAGNOSTICS; THERMAL EFFECTS; THIN FILMS;

ABLATION PLASMAS; PULSED ION BEAM EVAPORATION (IBE);

EVAPORATION;

EID: 0035246097     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.1026     Document Type: Article

References (5)