Pulsed ion-beam evaporation for material applications

PPPS 2001 - Pulsed Power Plasma Science 2001

Volumn 1, Issue , 2015, Pages 376-379

  Jiang, W ^a   Kitayama, S ^a   Suzuki, T ^a   Yatsui, K ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION; DEPOSITION; ION BEAMS; IONS;

DIAGNOSTIC TECHNIQUES; HIGH TEMPERATURE; MATERIAL APPLICATION; MATERIAL DEVELOPMENT; NANOSIZE MATERIALS; PULSED ION BEAMS; PULSED ION-BEAM EVAPORATION; THIN-FILM DEPOSITIONS;

HIGH SPEED PHOTOGRAPHY;

EID: 84952023705     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PPPS.2001.01002071     Document Type: Conference Paper

References (6)

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2. T. Sonegawa, C. Grigoriu, K. Masugata, K. Yatsui, Y. Shimotori, S. Furuuchi, and H. Yamamoto: Appl. Phys. Lett., 69, 2193 (1996).
3. K. Yatsui, C. Grigoriu, K. Masugata, W. Jiang, and T. Sonegawa: Jpn. J. Appl. Phys., 36, 4928 (1997).
4. K. Yatsui, T. Sonegawa, K. Ohtomo, and W. Jiang: Mater. Chem. & Phys., 54, 219 (1998).
5. W. Jiang, N. Hashimoto, H. Shinkai, K. Ohtomo, and K. Yatsui: Nucl. Instr. & Methods, A415, 533 (1998).
6. W. Jiang, N. Hashimoto, and K. Yatsui: IEEE Trans. Plasma Science, 28, 1549 (2000).