Pulsed power technology and its applications at extreme energy-density research institute (EDI), Nagaoka

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 2 B, 2001, Pages 921-929

  Yatsui, Kiyoshi ^a   Jiang, Weihua ^a   Suematsu, Hisayuki ^a   Harada, Nobuhiro ^a   Imada, Go ^a   Suzuki, Tsuneo ^a   Kinemuchi, Yoshiaki ^a   Yang, Sung Chae ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

B4C film; Flue gas treatment; Foil acceleration; Highly repetitive pulsed power generator; Ion beam ablation plasma; Ion beam evaporation; Nanosize powders

Indexed keywords

ALUMINUM NITRIDE; AMORPHOUS FILMS; BORON CARBIDE; CRYSTALLIZATION; ELECTRON BEAMS; EVAPORATION; FULLERENES; HARDNESS; HIGH TEMPERATURE OPERATIONS; ION BEAMS; LASER ABLATION; NANOSTRUCTURED MATERIALS; PLASMA APPLICATIONS; SOLUBILITY; THIN FILMS;

ION BEAM ABLATION PLASMA; ION BEAM EVAPORATION;

PULSED LASER DEPOSITION;

EID: 0035245191     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.921     Document Type: Article

References (36)