Thin-film deposition of (BaxSr1-x)TiO3 by pulsed ion beam evaporation

IEEE Transactions on Plasma Science

Volumn 28, Issue 5, 2000, Pages 1545-1548

  Sonegawa, Tomihiro ^a   Ohtomo, Katsuhiko ^b   Jiang, Weihua ^b   Yatsui, Kiyoshi ^b  

^a UNIVERSITY OF THE RYUKYUS   (Japan)

^b NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; PERMITTIVITY; PLASMA APPLICATIONS; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

PULSED ION BEAM EVAPORATION; THIN FILM DEPOSITION;

ION BEAMS;

EID: 0034289053     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.901230     Document Type: Article

References (18)

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