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Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Volumn 415, Issue 3, 1998, Pages 533-538

Characteristics of ablation plasma produced by pulsed light ion beam interaction with targets and applications to materials science

(5) Jiang, W a Hashimoto, N a Shinkai, H a Ohtomo, K a Yatsui, K a

a NAGAOKA UNIVERSITY OF TECHNOLOGY (Japan)

Author keywords

Ablation plasma; Dynamic pressure; Ion beam evaporation; Pulsed ion beam; Thin film deposition

Indexed keywords

BEAM PLASMA INTERACTIONS; EVAPORATION; FILM PREPARATION; HIGH SPEED PHOTOGRAPHY; LASER ABLATION; LASER PRODUCED PLASMAS; MATERIALS SCIENCE; PLASMA SOURCES; PULSED LASER APPLICATIONS;

ABLATION PLASMAS; PULSED LIGHT ION BEAM INTERACTION;

PLASMA ACCELERATORS;

EID: 0032179384 PISSN: 01689002 EISSN: None Source Type: Journal
DOI: 10.1016/S0168-9002(98)00364-7 Document Type: Article

Times cited : (28)

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