Preparation of polycrystalline silicon thin films by pulsed ion-beam evaporation

IEEE Transactions on Plasma Science

Volumn 30, Issue 5 I, 2002, Pages 1816-1819

  Yang, Sung Chae ^a   Suematsu, Hisayuki ^a   Jiang, Weihua ^a   Yatsui, Kiyoshi ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Ion beams; Plasma applications; Pulse power systems; Silicon; Thin films

Indexed keywords

ABLATION; CRYSTALLINE MATERIALS; CRYSTALLIZATION; DEPOSITION; DIFFRACTION; EVAPORATION; FILM PREPARATION; ION BEAMS; PLASMA DENSITY; PLASMA HEATING; THIN FILMS;

ABLATION PLASMA; CRYSTALLINITY; PULSED ION BEAM EVAPORATION;

POLYSILICON;

EID: 0036826846     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2002.806619     Document Type: Article

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