Time-modulated chemical vapor deposition of diamond films

Journal of Materials Engineering and Performance

Volumn 14, Issue 2, 2005, Pages 163-172

  Jackson, M J ^a   Robinson, G M ^a   Ahmed, W ^b   Sein, H ^b   Jones, A N ^b   Ali, N ^c   Titus, E ^c   Fan, Q H ^c   Gracio, J ^c  

^a PURDUE UNIVERSITY   (United States)

^b MANCHESTER METROPOLITAN UNIVERSITY   (United Kingdom)

^c UNIVERSITY OF AVEIRO   (Portugal)

Author keywords

Biomedical applications; Chemical vapor deposition; Diamond films; Thin films

Indexed keywords

BIOMEDICAL APPLICATIONS; INTRINSIC STRESSES; OPTICAL APPLICATIONS; SUBSTRATE TEMPERATURE;

BIOMEDICAL ENGINEERING; CHEMICAL VAPOR DEPOSITION; METHANE; PROFILOMETRY; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; THIN FILMS; VICKERS HARDNESS TESTING;

DIAMOND FILMS;

EID: 18844458896     PISSN: 10599495     EISSN: None     Source Type: Journal    
DOI: 10.1361/10599490522338     Document Type: Article

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