![]() |
Volumn 36, Issue 8, 1997, Pages 5197-5201
|
Analyses of an oriented diamond nucleation processes on Si substrate by hot filament chemical vapor deposition
a
|
Author keywords
Bias enhanced nucleation; Diamond film; Ellipsometry; Heteroepitaxy; Monitoring; Plasma
|
Indexed keywords
BIAS ENHANCED NUCLEATION (BEN);
HETEROEPITAXY;
HOT FILAMENT CHEMICAL VAPOR DEPOSITION (HF CVD);
CARBONIZATION;
CHEMICAL VAPOR DEPOSITION;
CRYSTAL ORIENTATION;
ELLIPSOMETRY;
EPITAXIAL GROWTH;
FILM GROWTH;
NUCLEATION;
PLASMAS;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTING SILICON;
SUBSTRATES;
TWINNING;
DIAMOND FILMS;
|
EID: 0031210896
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.36.5197 Document Type: Article |
Times cited : (25)
|
References (18)
|