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Volumn 36, Issue 8, 1997, Pages 5197-5201

Analyses of an oriented diamond nucleation processes on Si substrate by hot filament chemical vapor deposition

Author keywords

Bias enhanced nucleation; Diamond film; Ellipsometry; Heteroepitaxy; Monitoring; Plasma

Indexed keywords

BIAS ENHANCED NUCLEATION (BEN); HETEROEPITAXY; HOT FILAMENT CHEMICAL VAPOR DEPOSITION (HF CVD);

EID: 0031210896     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.5197     Document Type: Article
Times cited : (25)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.