Nucleation and bulk film growth kinetics of nanocrystalline diamond prepared by microwave plasma-enhanced chemical vapor deposition on silicon substrates

Applied Physics Letters

Volumn 69, Issue 12, 1996, Pages 1716-1718

  Lee, Joungchel ^a   Hong, Byungyou ^a   Messier, R ^a,b   Collins, R W ^a,b  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b Dept of Eng Science and Mechanics ^*

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000911372     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.118007     Document Type: Article

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