Diamond deposition on copper: studies on nucleation, growth, and adhesion behaviours

Journal of Materials Science

Volumn 34, Issue 6, 1999, Pages 1353-1365

  Fan, Q H ^a   Pereira, E ^a   Gracio J ^a  

^a UNIVERSITY OF AVEIRO   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

ABRASIVE COATINGS; ADHESION; COPPER; CRYSTAL GROWTH; DENSITY (SPECIFIC GRAVITY); FILMS; MICROWAVES; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PRESSURE EFFECTS; RESIDUAL STRESSES; SUBSTRATES;

FREE STANDING DIAMOND FILMS; GAS PRESSURE; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION; MICROWAVE POWER; TITANIUM INTERLAYER;

DIAMONDS;

EID: 0033101006     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1004566502572     Document Type: Article

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