Role of substrate temperature during diamond film growth using the newly developed time-modulated chemical vapor deposition process

Journal of Materials Science Letters

Volumn 22, Issue 14, 2003, Pages 1039-1042

  Ali, N ^a   Kousar, Y ^a   Fan, Q H ^a   Neto, V F ^a   Gracio, J ^a  

^a UNIVERSITY OF AVEIRO   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COATINGS; CRYSTAL ORIENTATION; FILM GROWTH; MORPHOLOGY; SURFACE ROUGHNESS;

PHASE PURITY;

DIAMOND FILMS;

EID: 0041696626     PISSN: 02618028     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1024705812865     Document Type: Article

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