Implementation of the time-modulated process to produce diamond films using microwave-plasma and hot-filament CVD systems

Vacuum

Volumn 71, Issue 4, 2003, Pages 445-450

  Ali, N ^a   Fan, Q H ^a   Kousar, Y ^a   Ahmed, W ^b   Gracio, J ^a  

^a UNIVERSITY OF AVEIRO   (Portugal)

^b MANCHESTER METROPOLITAN UNIVERSITY   (United Kingdom)

Author keywords

CVD; Diamond; Morphology; Secondary nucleation

Indexed keywords

METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROWAVES; MORPHOLOGY; NUCLEATION; PLASMAS; POLYSILICON; RAMAN SPECTROSCOPY; SUBSTRATES; SURFACE ROUGHNESS;

TIME-MODULATED CHEMICAL VAPOR DEPOSITION (TMCVD);

DIAMOND FILMS;

EID: 0037775860     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(03)00003-4     Document Type: Article

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