Influence of B- and N-doping levels on the quality and morphology of CVD diamond

Thin Solid Films

Volumn 343-344, Issue 1-2, 1999, Pages 627-631

  Eccles, A J ^a   Steele, T A ^a   Afzal, A ^b   Rego, C A ^b   Ahmed, W ^b   May, P W ^c   Leeds, S M ^c  

^a Millbrook Instruments Limited   (United Kingdom)

^b MANCHESTER METROPOLITAN UNIVERSITY   (United Kingdom)

^c UNIVERSITY OF BRISTOL   (United Kingdom)

Author keywords

Chemical vapour deposition; Diamond; Secondary ion mass spectrometry

Indexed keywords

CRYSTAL LATTICES; FILM GROWTH; MORPHOLOGY; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING BORON; SEMICONDUCTING DIAMONDS; SEMICONDUCTING FILMS; SEMICONDUCTOR DOPING;

HOT FILAMENT ASSISTED CHEMICAL VAPOR DEPOSITION; MICROWAVE PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION;

DIAMOND FILMS;

EID: 0032627482     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01667-8     Document Type: Article

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