Ultrahigh particle density seeding with nanocrystal diamond particles

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 279-281

  Makita, H ^a   Nishimura, K ^b   Jiang, N ^a   Hatta, A ^a   Ito, T ^a   Hiraki, A ^a  

^a OSAKA UNIVERSITY   (Japan)

^b Kita Kyushu Polytechnics College   (Japan)

Author keywords

Chemical vapour deposition; Diamond; Nucleation; Surface morphology

Indexed keywords

CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; NANOSTRUCTURED MATERIALS; NUCLEATION; PARTICLE SIZE ANALYSIS; PARTICLES (PARTICULATE MATTER); PLASMA APPLICATIONS; SILICON; SUBSTRATES; SURFACES; SYNTHESIS (CHEMICAL);

MAGNETO ACTIVE MICROWAVE PLASMA; NANOCRYSTAL DIAMOND PARTICLES; SEEDING PRETREATMENT; ULTRAHIGH PARTICLE DENSITY SEEDING;

DIAMOND FILMS;

EID: 0030217659     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08652-X     Document Type: Article

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