Time-modulated CVD on 0.8 μm-WC-10%-Co hardmetals: Study on diamond nucleation and coating adhesion

Diamond and Related Materials

Volumn 13, Issue 3, 2004, Pages 495-502

  Ali, N ^a   Cabral, G ^a   Lopes, A B ^a   Gracio, J ^a  

^a UNIVERSITY OF AVEIRO   (Portugal)

Author keywords

Chemical vapour deposition (CVD); Diamond nucleation; WC Co hardmetal

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COBALT; CRYSTALLIZATION; FILM GROWTH; NUCLEATION; POLYCRYSTALLINE MATERIALS; RAMAN SPECTROSCOPY;

POLYCRYSTALLINE DIAMOND FILMS; TIME-MODULATED CHEMICAL VAPOR DEPOSITION (TMCVD); VACUUM CHAMBER;

DIAMOND FILMS;

DIAMOND;

EID: 1842784716     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2003.12.001     Document Type: Article

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