Spatially resolved optical emission spectroscopy of pulse magnetron sputtering discharge

Thin Solid Films

Volumn 475, Issue 1-2 SPEC. ISS., 2005, Pages 91-96

  Kim, Yong M ^a   Jung, Min J ^a   Oh, Soo G ^b   Han, Jeon G ^a  

^a Sungkyunkwan University   (South Korea)

^b Ajou University   (South Korea)

Author keywords

Pulsed plasma; Reactive magnetron sputtering; Spatially resolved OES

Indexed keywords

ATOMIC FORCE MICROSCOPY; CAMERAS; CHARGE COUPLED DEVICES; ELECTRIC DISCHARGES; ELECTRIC POTENTIAL; ELECTROSTATICS; EMISSION SPECTROSCOPY; SILICON WAFERS; TITANIUM NITRIDE;

ELECTROSTATIC PROBES; PULSED PLASMA; REACTIVE MAGNETRON SPUTTERING; SPATIALLY RESOLVED OES;

MAGNETRON SPUTTERING;

EID: 13444267781     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.07.020     Document Type: Conference Paper

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