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Volumn 111, Issue 2-3, 1999, Pages 263-268
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Optical emission spectroscopy as a tool for designing and controlling the deposition of graded TiAlN layers by ECR-assisted reactive RF sputtering
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Author keywords
ECR; Graded layer; OES; Reactive sputtering; TiAlN
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Indexed keywords
ALUMINUM NITRIDE;
CRYSTAL ORIENTATION;
ELECTRIC POTENTIAL;
ELECTRON CYCLOTRON RESONANCE;
MAGNETRON SPUTTERING;
PLASMA APPLICATIONS;
SILICON;
SPUTTER DEPOSITION;
STEEL;
TITANIUM NITRIDE;
X RAY DIFFRACTION ANALYSIS;
ALUMINUM;
AUGER ELECTRON SPECTROSCOPY;
SURFACE STRUCTURE;
TITANIUM;
TITANIUM COMPOUNDS;
TOOL STEEL;
X RAY CRYSTALLOGRAPHY;
OPTICAL EMISSION SPECTROSCOPY (OES);
TITANIUM ALUMINUM NITRIDE;
CERAMIC COATINGS;
PROTECTIVE COATINGS;
SPECTROSCOPY;
OPTICAL EMISSION SPECTROSCOPY (OES);
PLASMA REACTIVE SPUTTERING;
TITANIUM ALUMINUM NITRIDE;
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EID: 0032675785
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/S0257-8972(98)00823-8 Document Type: Article |
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Times cited : (12)
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References (21)
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