Influence of substrate bias voltage on the in situ stress measured by an improved optical cantilever technique of sputtered chromium films

Thin Solid Films

Volumn 384, Issue 1, 2001, Pages 102-108

  Gautier, C ^a   Moulard, G ^a   Chatelon, J P ^a,b   Motyl, G ^c  

^a UNIVERSITÉ JEAN MONNET   (France)

^b DIOM   (France)

^c UNIVERSITÉ JEAN MONNET   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; ELECTRIC POTENTIAL; MAGNETRON SPUTTERING; STRESS ANALYSIS; SUBSTRATES; THIN FILMS;

OPTICAL CANTILEVER TECHNIQUES;

METALLIC FILMS;

EID: 0035281945     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01806-X     Document Type: Article

References (21)

1. Martin P.J. J. Mater. Sci. 21:1986;1.
2. Terrat J.P., Gaucher A., Hadj-Rabah H., Fillit R.Y. Surf. Coat. Technol. 45:1991;59.
3. Moulard G., Contoux G., Gardet G., Motyl G., Courbon M. Surf. Coat. Technol. 97:1997;206.
4. Moulard G. Ph.D. Thesis. 1997;University of Saint-Etienne, France.
5. Windischmann H. Crit. Rev. Solid State. 17:1992;547.
6. Moulard G., Contoux G., Gardet G., Motyl G., Courbon M. J. Vac. Sci. Technol. A. 16:1998;736.
7. Stoney G.G. Soc. Lond. A. 82:1909;172.
8. Hoffman R.W. Hass G., Thun R.E. Physics of Thin Films. 3:1966;211 Academic Press, New York and London.
9. Hoffman R.W. Anderson J.C. The Use of Thin Films in Physical Investigations. 1966;261 Academic Press, London.
10. Hoffman D.W., Thornton J.A. Thin Solid Films. 40:1977;355.
11. Thornton H., Lamb J. Thin Solid Films. 119:1984;87.
12. Sundgren J.E. Thin Solid Films. 128:1985;21.
13. Thornton J.A., Hoffman D.W. Thin Solid Films. 171:1989;5.
14. Ohring M. The Material Science of Thin Films. 1992;429 Academic Press Inc, San Diego.
15. Ljungcrantz H., Hultman L., Sundgren J.E., Karlsson L. J. Appl. Phys. 78:1995;832.
16. Grantscharova E. Thin Solid Films. 224:1993;28.
17. Van Der Drift A. Philips Res. Rep. 22:1967;267.
18. Knuyt G., Quaeyhaegens C., D'Haen J., Stals L.M. Thin Solid Films. 258:1995;159.
19. Deng Y., Lambeth D.N., Laughlin D.E. IEEE Trans. Magn. 28:1992;3096.
20. Piot O., Gautier C., Machet J. High Temp. Mater. Process. 2:1998;391.
21. Window B., Harding G.L., Horrigan C., Bell T. J. Vac. Sci. Technol. A. 10:1992;3278.