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Volumn 72, Issue 1, 2003, Pages 59-69

Investigation of a pulsed magnetron sputtering discharge with a vacuum pentode modulator power supply

Author keywords

Duty cycle; Pulse rate; Pulsed magnetron discharge

Indexed keywords

DIFFUSION; ELECTRIC CURRENTS; ELECTRIC DISCHARGES; ELECTRONS; IONIC CONDUCTION; PLASMAS; SPUTTER DEPOSITION;

EID: 0041659216     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(03)00100-3     Document Type: Article
Times cited : (4)

References (26)
  • 3
    • 84895179832 scopus 로고    scopus 로고
    • Germany Patent 3 700 633 (1987), US Patent 5 015 493 (1991)
    • Gruen R. Germany Patent 3 700 633 (1987), US Patent 5 015 493 (1991).
    • Gruen, R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.