Deposition of TiOx thin film using the grid-assisting magnetron sputtering

Thin Solid Films

Volumn 447-448, Issue , 2004, Pages 430-435

  Jung, Min J ^a   Kim, Yong M ^a   Chung, Yun M ^a   Han, Jeon G ^a   Bang, K Yoon ^b  

^a Sungkyunkwan University   (South Korea)

^b Hanyang University   (South Korea)

Author keywords

Grid; Magnetron sputtering; OES; Ti; Titanium oxide

Indexed keywords

ANISOTROPY; CARRIER CONCENTRATION; DEPOSITION; ELECTRIC FIELD EFFECTS; ION BOMBARDMENT; IONIZATION; MAGNETRON SPUTTERING; OPTICAL COATINGS; OPTICAL FIBERS; REFRACTIVE INDEX; TITANIUM; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY;

GRID; IONIZED CLUSTER BEAM (ICB); OPTICAL EMISSION SPECTROSCOPY (OES);

THIN FILMS;

EID: 1342323679     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)01120-9     Document Type: Conference Paper

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