SCOPUS 정보 검색 플랫폼

Plasma Sources Science and Technology

Volumn 11, Issue 1, 2002, Pages 37-46

A spatially resolved spectroscopic study of ionization in the planar magnetron discharge

(2) Christou, C a,b Barber, Z H a

a UNIVERSITY OF CAMBRIDGE (United Kingdom)

b Applied Materials UK Ltd (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ATOMS; DIFFUSION IN SOLIDS; ELECTRIC DISCHARGES; EMISSION SPECTROSCOPY; IONIZATION; IONS; MAGNETIC FIELDS; MAGNETRON SPUTTERING; MATHEMATICAL TRANSFORMATIONS; TITANIUM;

ABEL TRANSFORMATION; DC PLANAR MAGNETRON; NON-UNIFORM EROSION PROFILE; PLANA MAGNETRON DISCHARGE; PLASMA EMISSION; PLASMA PROPERTY; SPATIALLY RESOLVED OPTICAL EMISSION SPECTROSCOPY;

PLASMA DENSITY;

EID: 0036466066 PISSN: 09630252 EISSN: None Source Type: Journal
DOI: 10.1088/0963-0252/11/1/304 Document Type: Article

Times cited : (5)

References (33)

1
- 0003494870
- (New York: Academic)
- (1978) Thin Film Processes
- Vossen, J.L.¹ Kern, W.²

2
- 70649103994
- (1990) J. Vac. Sci. Technol. A , vol.8 , pp. 902
- Wendt, A.E.¹ Lieberman, M.A.²

3
- 0003068818
- (1974) Research and Development , vol.25 , pp. 37
- Chapin, J.S.¹

4
- 0032028412
- (1998) Surf. Coatings Technol. , vol.100-101 , pp. 280-286
- Musil, J.¹

5
- 0042440174
- (1989) J. Vac. Sci. Technol A , vol.7 , pp. 151
- Yamashita, M.¹

6
- 0000756838
- (1997) J. Vac. Sci. Technol. A , vol.15 , pp. 1084
- Schneider, J.M.¹ Sproul, W.D.² Voevedin, A.A.³ Matthews, A.⁴

7
- 0006298151
- (1999) Thin Solid Films , vol.343 , pp. 38
- Chiu, K.-F.¹ Barber, Z.H.² Somekh, R.E.³

8
- 0000332851
- (1998) Phys. Plasmas , vol.5 , pp. 1624
- Hopwood, J.¹

9
- 0034318373
- (2000) J. Vac. Sci. Technol A , vol.18 , pp. 2897
- Christou, C.¹ Barber, Z.H.²

10
- 84957350574
- (1993) J. Vac. Sci. Technol. , vol.11 , pp. 2903
- Holber, W.M.¹ Logan, J.S.² Grabarz, H.J.³ Yeh, J.T.C.⁴ Caughman, J.B.O.⁵ Sugarman, A.⁶ Turene, F.⁷

11
- 36449002062
- (1993) Appl. Phys. Lett. , vol.63 , pp. 3285
- Rossnagel, S.M.¹ Hopwood, J.²

12
- 0000522608
- (1994) J. Vac. Sci. Technol. B , vol.12 , pp. 449
- Rossnagel, S.M.¹ Hopwood, J.²

13
- 0003401326
- ed J A Hopwood (New York: Academic)
- (2000) Thin Films Ionized Physical Vapor Deposition , vol.27
- Rossnagel, S.M.¹

14
- 0006294591
- (2000) Vacuum , vol.58 , pp. 234
- Christou, C.¹ Chiu, K.-F.² Barber, Z.H.³

15
- 0023982178
- (1988) Plasma Chemistry and Plasma Processing , vol.8 , pp. 35
- Hershkowitz, N.¹ Cho, M.H.² Nam, C.H.³ Intrator, T.⁴

16
- 0000534928
- (1995) Plasma Sources Sci. Technol. , vol.4 , pp. 234
- Allen, J.E.¹

17
- 84957275571
- (1986) J. Vac. Sci. Technol. A , vol.4 , pp. 1822
- Rossnagel, S.M.¹ Kaufman, H.R.²

18
- 0004056077
- (New York: McGraw-Hill)
- (1964) Plasma Spectroscopy
- Griem, H.R.¹

19
- 0028424389
- (1994) Appl. Spectroscopy , vol.48
- Burns, D.H.¹

20
- 0000357495
- ed M McNally (Dordrecht: Kluwer)
- (1988) Trans. International Astronomical Union, XXB , pp. 168
- Kurucz, R.L.¹

21
- 0010495125
- (1975) Smithsonian Astrophysical Observatory Special Report , pp. 362
- Kurucz, R.L.¹ Peytremann, E.²

22
- 0006329162
- NSRDS-NBS 22
- (1969)
- Wiese, W.L.¹ Smith, M.W.² Miles, B.M.³

23
- 0006329163
- (1988) J. Phys. Chem. Ref. Data , vol.17 , Issue.SUPPL. 3
- Martin, G.A.¹ Fuhr, G.A.² Wiese, W.L.³

24
- 0033320638
- (1999) Surf. Coatings Technol. , vol.116-119 , pp. 1083
- Spolaore, M.¹ Antoni, V.² Bagatin, M.³ Buffa, A.⁴ Cavazzana, R.⁵ Desideri, D.⁶ Martines, E.⁷ Pomaro, N.⁸ Serianni, G.⁹ Tramontin, L.¹⁰

25
- 0003735899
- (New York: IEEE)
- (1988) Principles of Computerized Tomographic Imaging
- Kak, A.C.¹ Slaney, M.²

26
- 0003494736
- (Amsterdam: North-Holland)
- (1968) Plasma Diagnostics
- Lochte-Holtgreven, W.¹

27
- 0019079720
- (1980) Appl. Spectroscopy , vol.34 , pp. 696
- Blades, M.W.¹ Horlick, G.²

28
- 0020782345
- (1983) Appl. Spectroscopy , vol.37 , pp. 371
- Blades, M.W.¹

29
- 0031165066
- (1997) Measurement Sci. Technol. , vol.8 , pp. 618
- Debal, F.¹ Wautelet, M.² Dauchot, J.P.³ Hecq, M.⁴

30
- 0033531801
- (1999) Thin Solid Films , vol.345 , pp. 167
- Matsuda, Y.¹ Muta, M.² Fujiyama, H.³

31
- 0031384067
- (1997) Surf. Coatings Technol. , vol.97 , pp. 742
- Schielke, W.¹ Röttig, G.² Bandlow, I.³ Pickalov, V.⁴ Ohl, A.⁵

32
- 0003730831
- (New York: Wiley)
- (1994) Principles of Plasma Discharges and Materials Processing
- Lieberman, M.A.¹ Lichtenberg, A.J.²

33
- 0032665057
- (1999) J. Phys. D: Appl. Phys. , vol.32 , pp. 1142
- Kondo, S.¹ Nanbu, K.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.