Improvements in performance of focused ion beam cross-sectioning: Aspects of ion-sample interaction

Journal of Electron Microscopy

Volumn 53, Issue 5, 2004, Pages 443-449

  Ishitani, Tohru ^a   Umemura, Kaoru ^a   Ohnishi, Tsuyoshi ^a   Yaguchi, Toshie ^b   Kamino, Takeo ^b  

^a HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

^b HITACHI LTD   (Japan)

Author keywords

Cross sectioning; Focused ion beam; Sample preparation; Scanning transmission electron microscope; Transmission electron microscope

Indexed keywords

GALLIUM;

ARTICLE; ELECTRON MICROSCOPY; LABORATORY DIAGNOSIS; METHODOLOGY;

GALLIUM; MICROSCOPY, ELECTRON; SPECIMEN HANDLING;

ELECTRONS; GALLIUM COMPOUNDS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; ION IMPLANTATION; MILLING (MACHINING); SCANNING ELECTRON MICROSCOPY;

CROSS-SECTIONING; FOCUSED IONS BEAMS; GALLIUM FOCUSED ION BEAMS; MILLING RATE; PERFORMANCE; SAMPLE PREPARATION; SCANNING TRANSMISSION ELECTRON MICROSCOPES; SITE-SPECIFIC; TRANSMISSION ELECTRON; TRANSMISSION ELECTRON MICROSCOPE;

FOCUSED ION BEAMS;

EID: 13444257979     PISSN: 00220744     EISSN: None     Source Type: Journal    
DOI: 10.1093/jmicro/dfh078     Document Type: Article

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