Flattening of surface by sputter-etching with low-energy ions

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 40, Issue 5 A, 2001, Pages

  Matsutani, T ^a   Iwamoto, K ^a   Nagatomi, T ^a   Kimura, Y ^a   Takai, Y ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Flattening; Focused ion beam; Low energy ion beam; Specimen preparation; Transmission electron microscopy

Indexed keywords

ETCHING; ION BEAMS; POSITIVE IONS; SPECIMEN PREPARATION; SPUTTERING; TRANSMISSION ELECTRON MICROSCOPY;

FOCUSED ION BEAM (FIB) TECHNIQUES;

SEMICONDUCTING GALLIUM ARSENIDE;

EID: 0035328907     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.l481     Document Type: Article

References (13)