Specimen preparation technique for a microstructure analysis using the focused ion beam process

Furukawa Review

Volumn , Issue 22, 2002, Pages

  Yabusaki, Kozue ^a   Sasaki, Hirokazu ^a  

^a Yokohama R and D Lab   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRO-OPTICAL SEMICONDUCTOR DEVICES; FOCUSED ION BEAMS (FIB); PRODUCTION PROCESSES;

AUGER ELECTRON SPECTROSCOPY; CUTTING; ELECTRIC POTENTIAL; ELECTROOPTICAL MATERIALS; IMAGE ANALYSIS; ION BEAMS; MICROANALYSIS; MICROSTRUCTURE; POLISHING; TRANSMISSION ELECTRON MICROSCOPY;

SEMICONDUCTOR DEVICES;

EID: 84862468238     PISSN: 13481797     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (2)

1. H.Koike, Y.Kondo: Proc. of the 56th Annual Meeting of the Japanese Society of Electron Microscopy 203, 2000 (in Japanese)
2. K.Mogi, T.Iizuka and M.Suzuki: J. Surface Analysis, 7, 2000, 228 (in Japanese)