High resolution templates for step and flash imprint lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 1, 2002, Pages 205-213

  Resnick, Doug J ^a   Dauksher, W J ^a   Mancini, D ^a   Nordquist, K J ^a   Ainley, E ^a   Gehoski, K ^a   Baker, J H ^a   Bailey, T C ^b   Choi, B J ^b   Johnson, S ^b   Sreenivasan, S V ^b   Ekerdt, J G ^b   Willson, C G ^b  

^a MOTOROLA INC   (United States)

^b The University of Texas at Austin   (United States)

Author keywords

Flash; Imprint; Lithography; Step; Template

Indexed keywords

CONDUCTIVE MATERIALS; ELECTRON BEAMS; GLASS; INDIUM COMPOUNDS; MASKS; OPTICAL RESOLVING POWER; PRESSURE EFFECTS; PRINTING; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; TRANSPARENCY;

STEP AND FLASH IMPRINT LITHOGRAPHY (SFIL);

LITHOGRAPHY;

EID: 0000996008     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.472293     Document Type: Article

References (10)

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