Cost of ownership analysis for patterning using step and flash imprint lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 2, 2002, Pages 903-909

  Sreenivasan, S V ^a   Willson, C G ^a   Schumaker, N E ^b   Resnick, D J ^c  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^b MOLECULAR IMPRINTS INC   (United States)

^c MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FUSED SILICA; MASKS; MICROELECTRONICS; NANOTECHNOLOGY;

EXTREME ULTRAVIOLET (EUV) PHOTOLITOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0036380112     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.472275     Document Type: Article

References (5)

1. Mathew Colburn, Todd Bailey, Byung Jin Choi, John G. Ekerdt, S.V. Sreenivasan, C. Grant Willson, "Step and Flash Imprint Lithography, " Solid State Technology, July 2001.
2. S.Y. Chou, P.R. Krauss, P.J. Renstrom, "Nanoimprint lithography, " J. Vac. Sci., Tech. B, 1996. 14(6): p. 4129.
3. Y. Xia, G.M. Whitesides, "Soft Lithography, " Angew. Chem. Int. Ed. Engl., 1998. 37: p. 550.
4. SEMATECH's Lithography Cost of Ownership http://www.sematech.org/public/resources/coo/index.htm
5. Resnick, D.J. et al., "High Resolution Templates for Step and Flash Imprint Lithography, " SPIE MicroLithography Conference, March 2002.