Mesoscale modeling for SFIL simulating polymerization kinetics and densification

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 1, 2004, Pages 348-360

  Burns, Ryan L ^a   Johnson, Stephen C ^a   Schmid, Gerard M ^a   Kim, E K ^a   Dickey, Michael D ^a   Meiring, Jason ^a   Burns, Sean D ^b   Stacey, Nicholas A ^c   Willson, C Grant ^a   Convey, D ^d   Wei, Y ^d   Fejes, P ^d   Gehoski, K ^d   Mancini, D ^d   Nordquist, K ^d   Dauksher, W J ^d   Resnick, D J ^d  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

^c MOLECULAR IMPRINTS INC   (United States)

^d MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETCH BARRIERS; STEP AND FLASH IMPRINT LITHOGRAPHY (SFIL); UV CURING;

CURING; DENSIFICATION; FINITE ELEMENT METHOD; IMAGING SYSTEMS; MASKS; MONTE CARLO METHODS; POLYMERIC GLASS; REACTION KINETICS; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION;

PHOTOLITHOGRAPHY;

EID: 3142646098     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.536216     Document Type: Conference Paper

References (17)

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