Step and flash imprint lithography using UV-transparent, electrically conductive templates

2003 Nanotechnology Conference and Trade Show - Nanotech 2003

Volumn 3, Issue , 2003, Pages 47-50

  Hooper, A E ^a   Talin, A A ^b   Dauksher, W J ^a   Baker, J H ^a   Convey, D ^a   Eschrich, T ^a   Resnick, D J ^a   Bailey, T C ^c   Johnson, S ^c   Willson, C G ^c  

^a MOTOROLA INC   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

^c The University of Texas at Austin   (United States)

Author keywords

Indium Tin Oxide; Step and Flash Imprint Lithography; Transparent Conductive Oxide

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; CARRIER CONCENTRATION; CATHODES; CRYSTALLIZATION; DIGITAL INSTRUMENTS; GRAIN BOUNDARIES; INDIUM COMPOUNDS; LIGHT TRANSMISSION; LITHOGRAPHY; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; ULTRAVIOLET SPECTROMETERS; X RAY DIFFRACTION ANALYSIS;

PHOTOPLATES; POLYCRYSTALLINE STRUCTURES; STEP AND FLASH IMPRINT LITHOGRAPHY (SFIL); TEMPLATES;

THIN FILMS;

EID: 6344233277     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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